Dai Nippon Printing

Assembly Line

DNP Develops Photomask Process for 3nm EUV Lithography

📅 Date:

🔖 Topics: Partnership

🏭 Vertical: Semiconductor

🏢 Organizations: imec, Dai Nippon Printing

Dai Nippon Printing Co., Ltd. (DNP) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography process that supports Extreme Ultra-Violet (EUV) lithography, the cutting-edge process for semiconductor manufacturing. Through joint development with partners, such as imec, DNP will continue to develop more advanced photomasks capable of supporting processes finer than 3nm and even beyond 2nm.

Read more at imec Press